Title:
The adjustment method of an adaptive optics system, and an adaptive optics system
Document Type and Number:
Japanese Patent JP5919100
Kind Code:
B2
Abstract:
A positional deviation between a phase distribution in a wavefront sensor and a compensation phase pattern in a wavefront modulator is corrected in a short time and with high accuracy by a method including a first step of causing the wavefront modulator to display a singularity generation pattern, a second step of measuring in the sensor an adjustment wavefront shape when an optical image modulated by the singularity generation pattern enters the wavefront sensor, a third step of detecting a position of a singularity in the adjustment wavefront shape from a measurement result in the sensor, and a fourth step of adjusting a positional deviation between a wavefront shape measured in the wavefront sensor and a compensation pattern displayed on the wavefront modulator based on a positional deviation of the position of the singularity.
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Inventors:
Huang Hong
Application Number:
JP2012127222A
Publication Date:
May 18, 2016
Filing Date:
June 04, 2012
Export Citation:
Assignee:
Hamamatsu Photonics Co., Ltd.
International Classes:
G02F1/01; A61B3/103; G01M11/02
Domestic Patent References:
| JP2005292662A | ||||
| JP2009192832A | ||||
| JP2008519298A |
Other References:
ABDUL AWWAL et al.,Characterization and Operation of a Liquid Crystal Adaptive Optics Phoropter,Proc. of SPIE,2003年12月31日, VOL.5169,p.104-122
HONGXIN HUANG et al.,Adaptive aberration compensation sysytem using a high-resolution liquid crystal on silicon spatial phase modulator,Proc. of SPIE,2008年12月 3日,VOL.7156,p.71560F-1-71560F-10
HONGXIN HUANG et al.,Adaptive aberration compensation sysytem using a high-resolution liquid crystal on silicon spatial phase modulator,Proc. of SPIE,2008年12月 3日,VOL.7156,p.71560F-1-71560F-10
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Satoru Ishida
Shotaro Terasawa
Yoshiki Kuroki
Satoru Ishida
Shotaro Terasawa