Title:
脂環式不飽和化合物、重合体、化学増幅レジスト組成物、及び該組成物を用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4386197
Kind Code:
B2
Abstract:
A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.
Inventors:
Katsumi Maeda
Kaichiro Nakano
Kaichiro Nakano
Application Number:
JP2005503094A
Publication Date:
December 16, 2009
Filing Date:
March 04, 2004
Export Citation:
Assignee:
NEC
International Classes:
C07C35/52; C07C43/178; C07C43/196; C07C69/63; C08F32/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP200272484A |
Foreign References:
| WO2002079287A1 |
Attorney, Agent or Firm:
Akio Miyazaki
Ishibashi Masayuki
Masaaki Ogata
Ishibashi Masayuki
Masaaki Ogata