Title:
【発明の名称】プラズマ発生装置及びプラズマ発生装置を用いた分析装置並びに質量分析装置
Document Type and Number:
Japanese Patent JP2970520
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an apparatus for generating a microwave plasma capable of efficiently generating the stable large-caliber plasma at a high temperature and density. SOLUTION: This apparatus for treating a substrate with a microwave plasma is obtained by converting the mode from a square type waveguide 40 into a circular coaxial waveguide 50, lengthening a cylindrical outer conductor 52 of the circular coaxial waveguide 50 from an inner conductor 51 of the circular coaxial waveguide 50, attaching a metallic end plate 70 having an opening 72 of the inside diameter comparable to that of a cylindrical cavity 53 installed in the inner conductor 51 to a position (a gap part) at a distance (d) from the tip of the inner conductor 51, arranging a discharge tube 80 from at least the interior of the cylindrical cavity 53 in the inner conductor 51 through the opening 72 and generating the plasma in the discharge tube 80 by using a microwave electric field produced in the gap part. A large power can stably be fed to the plasma without using a coaxial cable and the plasma at a high temperature and density can be generated for various gases within a wide range extending from a low pressure (about 10<-6> Torr) to a high pressure (atmospheric pressure) according to the purpose.
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Inventors:
OKAMOTO YUKIO
Application Number:
JP3032296A
Publication Date:
November 02, 1999
Filing Date:
February 19, 1996
Export Citation:
Assignee:
HITACHI SEISAKUSHO KK
International Classes:
H05H1/46; C30B33/12; H01J27/16; H01J37/08; H01J49/10; H01L21/203; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; H01L39/24; (IPC1-7): H01J49/10; H01J27/16; H01J37/08; H05H1/46
Domestic Patent References:
| JP62229641A | ||||
| JP62208535A | ||||
| JP514490A | ||||
| JP62290054A |
Attorney, Agent or Firm:
Sakuta Yasuo