Title:
縮合系ポリマーを有する半導体用反射防止膜
Document Type and Number:
Japanese Patent JP4702559
Kind Code:
B2
Abstract:
There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.
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Inventors:
Takahiro Kishioka
Rikimaru Sakamoto
Yoshiomi Hiroi
Daisuke Maruyama
Rikimaru Sakamoto
Yoshiomi Hiroi
Daisuke Maruyama
Application Number:
JP2006512104A
Publication Date:
June 15, 2011
Filing Date:
April 06, 2005
Export Citation:
Assignee:
Nissan Chemical Industry Co., Ltd.
International Classes:
G03F7/11; C08G61/12; C08G73/06; C08L79/04; C09D163/00; C09D179/04; G03F7/09; H01L21/027
Domestic Patent References:
| JP2002148791A | 2002-05-22 | |||
| JPH04171920A | 1992-06-19 |
Foreign References:
| WO2002086624A1 | 2002-10-31 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro
Yusuke Murakoshi
Miyazaki Yoshio
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro
Yusuke Murakoshi