A base material for a device of microelectronics, micro opto-electronics, or micro mechanics

Japanese Patent JP6140259

B2

The specification teaches a device for use in the manufacturing of microelectronic, microoptoelectronic or micromechanical devices (microdevices) in which a contaminant absorption layer improves the life and operation of the microdevice. In a preferred embodiment the invention includes a mechanical supporting base, and discrete deposits of gas absorbing or contaminant removing material on the base by a variety of techniques and a layer for temporary protection of the contaminant removing material on top of the contaminant removing material. Passages are created in the layer which expose the contaminant removing material to atmosphere. The device may be used as a covering for the microdevice as well.

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Amiotti, Marco

JP2015240035A

May 31, 2017

December 09, 2015

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Saes Getters Sochieta Per Azioni

B81B7/02; G02B26/08; B01D53/14; B01D53/28; B01J20/02; B01J20/04; B81B3/00; B81B7/00; B81C1/00; C23C14/04; C23C16/04; H01L21/02; H01L21/68; H01L23/26

JP8078569A
JP9237847A
JP56137658A
JP7321251A
JP2000277525A

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Naori Kota
Satoshi Deno
Atsushi Ebiya

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