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Title:
バッチ熱処理チャンバ
Document Type and Number:
Japanese Patent JP7438399
Kind Code:
B2
Abstract:
A batch processing chamber and a process kit for use therein are provided. The process kit includes an outer liner having an upper outer liner and a lower outer liner, an inner liner, and a top plate and a bottom plate attached to an inner surface of the inner liner. The top plate and the bottom plate form an enclosure together with the inner liner, and a cassette is disposed within the enclosure. The cassette including shelves configured to retain a plurality of substrates thereon. The inner liner has inlet openings disposed on an injection side of the inner liner and configured to be in fluid communication with a gas injection assembly of a processing chamber, and outlet openings disposed on an exhaust side of the inner liner and configured to be in fluid communication with a gas exhaust assembly of the processing chamber. The inner surfaces of the enclosure comprise material configured to cause black-body radiation within the enclosure.

Inventors:
Tanus, Adele George
Chu, Schubert S.
Lau, Shu-Kwan
Shah, Kartik Bupendra
Choo, Tzuwomin
Moradian, Ala
Kumar, Surajit
Rangappa, Srinivasa
Chin, Chia Chong
Pawn Day, Biswas Kumar
Application Number:
JP2022563142A
Publication Date:
February 26, 2024
Filing Date:
July 12, 2021
Export Citation:
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Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/205; C23C16/44; C23C16/455; C23C16/458; H01L21/304; H01L21/683
Domestic Patent References:
JP2002532871A
JP2016526297A
JP9330884A
JP2009536267A
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation