Title:
基板保持装置および基板保持装置を備える基板処理装置
Document Type and Number:
Japanese Patent JP6946151
Kind Code:
B2
Abstract:
There is provided a device and method for accurately positioning a substrate on a stage by a simple method using power of a movement mechanism provided for a movable stage. A substrate holding device for holding a substrate is provided. The substrate holding device includes a substrate stage for supporting the substrate, a stage drive mechanism for causing the substrate stage to move, positioning pin for positioning the substrate on the substrate stage, first urging members each urging the positioning pin, and a stopper member capable of applying a force against the urging member to the positioning pin. The positioning pin is configured to move together with the substrate stage by the stage drive mechanism. The positioning pin moving together with the substrate stage allows the substrate to be positioned on the substrate stage.
Inventors:
Hiroaki Nishida
Application Number:
JP2017218564A
Publication Date:
October 06, 2021
Filing Date:
November 13, 2017
Export Citation:
Assignee:
Ebara Corporation
International Classes:
H01L21/68; B24B41/06; H01L21/304; H01L21/683
Domestic Patent References:
| JP2001342597A | ||||
| JP2017107900A | ||||
| JP2002319613A | ||||
| JP6037003A |
Attorney, Agent or Firm:
Toru Miyamae
Shinjiro Ono
Yukio Kanegae
Makoto Watanabe
Shinjiro Ono
Yukio Kanegae
Makoto Watanabe