Title:
A carbon content silicon oxide film, a closure film, and its use
Document Type and Number:
Japanese Patent JP6079842
Kind Code:
B2
Abstract:
A film comprising carbon-containing silicon oxide is obtained through chemical vapor deposition (CVD), and is used for a sealing film. A film comprising carbon-containing silicon oxide, which is formed by CVD using an organic silicon compound as a starting material, the organic silicon compound having a structure in which alkoxyalkyl is directly bonded to a silicon atom, and including, for example, compounds represented by general formulae (1) to (4), such film being used as a sealing film for a gas barrier member, an FPD device, a semiconductor device and the like.
Inventors:
Daiji Hara
Shimizu Masago
Shimizu Masago
Application Number:
JP2015175031A
Publication Date:
February 15, 2017
Filing Date:
September 04, 2015
Export Citation:
Assignee:
Tosoh Corporation
International Classes:
H01L21/316; C07F7/08; C07F7/18; C23C16/42; C23C16/50; H01L51/50; H05B33/02; H05B33/04
Domestic Patent References:
| JP2012140700A | ||||
| JP4218507A | ||||
| JP2006219721A | ||||
| JP2004320005A | ||||
| JP2002265474A | ||||
| JP2004193622A |
Foreign References:
| WO2010004948A1 |
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