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Title:
A charged particle beam drawing apparatus and a charged particle beam drawing method
Document Type and Number:
Japanese Patent JP6171062
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a drawing device which allows for proximity effect correction while taking account of influence of both patterns when drawing patterns under different drawing conditions.SOLUTION: A charged particle beam drawing device includes: a block generation unit for generating a plurality of area processing blocks in a drawing region where a plurality of drawing groups of different reference exposure dose is to be drawn; a block generation unit for generating a plurality of proximity effect correction processing blocks for correcting proximity effect for each drawing group region; an area density calculation unit for calculating area density of a figure pattern arranged for each area processing block; a weighting operation unit for weighting the area density by using the reference exposure dose of a corresponding drawing group region for each area processing block; and a proximity effect correction irradiation coefficient calculation unit for calculating the proximity effect correction irradiation coefficients by using the area density thus weighted for each proximity effect correction processing block.SELECTED DRAWING: Figure 1

Inventors:
Yasuo Kato
Jun Yashima
Akito Security
Application Number:
JP2016153634A
Publication Date:
July 26, 2017
Filing Date:
August 04, 2016
Export Citation:
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Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
JP2009064862A
JP2008226905A
JP2007227564A
JP2011100818A
JP2010225811A
JP2012019066A
JP2008277540A
JP2003318077A
JP2003133209A
Foreign References:
US5278419
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama