Title:
A charged particle beam drawing method and a charged particle beam drawing apparatus
Document Type and Number:
Japanese Patent JP6013089
Kind Code:
B2
Abstract:
A charged particle beam pattern writing method according to an embodiment, includes measuring a position displacement amount of a stage above which a target object is placed, in a rotation direction; and writing a pattern of a beam image on the target object above the stage while the beam image is rotated, by using a plurality of electrostatic lenses at least one of which is arranged in a magnetic field of each of the plurality of electromagnetic lenses whose magnetic fields are in opposite directions, to avoid a focus displacement of a charged particle beam passing through the plurality of electromagnetic lenses and to correct the position displacement amount measured, in the rotation direction of the stage.
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Inventors:
Munehiro Ogasawara
Takaya Toya
Jewel beetle Shuichi
Takaya Toya
Jewel beetle Shuichi
Application Number:
JP2012190173A
Publication Date:
October 25, 2016
Filing Date:
August 30, 2012
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
| JP2000357647A | ||||
| JP2004095862A | ||||
| JP2003332207A | ||||
| JP52147977A | ||||
| JP61101944A | ||||
| JP11354421A | ||||
| JP11067642A | ||||
| JP2009064841A | ||||
| JP2006261342A | ||||
| JP2013197289A |
Foreign References:
| US20100294955 |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama
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