Title:
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS
Document Type and Number:
Japanese Patent JP2018109765
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a chemically amplified negative resist composition that has improved resolution in patterning and can form a pattern with reduced line edge roughness (LER), and a resist patterning process.SOLUTION: A negative resist composition comprises (A) a sulfonium compound and (B) a base polymer comprising a polymer comprising a repeating unit represented by the formula (B1).SELECTED DRAWING: None
Inventors:
KOTAKE MASAAKI
WATANABE SATOSHI
MASUNAGA KEIICHI
YAMADA KENJI
OHASHI MASAKI
WATANABE SATOSHI
MASUNAGA KEIICHI
YAMADA KENJI
OHASHI MASAKI
Application Number:
JP2017247739A
Publication Date:
July 12, 2018
Filing Date:
December 25, 2017
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/038; C08F12/00; C08F20/30; G03F7/004; G03F7/20
Domestic Patent References:
| JP2013061642A | 2013-04-04 | |||
| JP2003302760A | 2003-10-24 |
Attorney, Agent or Firm:
Hideaki International Patent Office
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