Title:
A chemicals amplification resist material and a pattern formation method
Document Type and Number:
Japanese Patent JP6222057
Kind Code:
B2
Abstract:
A chemically amplified resist composition comprising a base polymer, an acid generator, and a basic compound which is a cholanoate having an acid labile group-protected amino group has a high contrast of alkaline dissolution rate before and after exposure and high resolution and forms a pattern of satisfactory profile with minimal roughness.
Inventors:
Jun Hatakeyama
Masaki Ohashi
Masaki Ohashi
Application Number:
JP2014237527A
Publication Date:
November 01, 2017
Filing Date:
November 25, 2014
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C271/28; C07J41/00; C07J51/00; G03F7/038; G03F7/039
Domestic Patent References:
| JP2008107513A | ||||
| JP2010250076A | ||||
| JP2001235866A | ||||
| JP2012226313A | ||||
| JP2005148291A | ||||
| JP11109628A | ||||
| JP10221852A | ||||
| JP10232495A |
Foreign References:
| WO2013137157A1 | ||||
| US6268106 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki