Title:
化学増幅レジスト組成物及びそれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4393010
Kind Code:
B2
Abstract:
A chemically amplified resist composition which comprises a base resin reacting in the presence of an acid, a photo acid generator generating an acid upon exposure, and a compound having the combination of an acetal moiety and a site which is eliminated by an acid in its molecule, or which comprises a base resin, which is a copolymer having the combination of an acetal moiety and a site eliminated by an acid in one repeating unit and reacts in the presence of an acid, and a photo acid generator generating an acid upon exposure.
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Inventors:
Yamamoto Gen
Kenichi Murakami
Satoshi Takechi
Kenichi Murakami
Satoshi Takechi
Application Number:
JP2001111740A
Publication Date:
January 06, 2010
Filing Date:
April 10, 2001
Export Citation:
Assignee:
Fujitsu Microelectronics Limited
International Classes:
G03F7/039; C08F220/12; C08F232/04; H01L21/027
Domestic Patent References:
| JP11012326A | ||||
| JP6167811A | ||||
| JP10239847A | ||||
| JP2001083709A | ||||
| JP2000047386A | ||||
| JP2001075282A | ||||
| JP5262699A | ||||
| JP9077720A | ||||
| JP10182744A | ||||
| JP2000356481A | ||||
| JP2000029215A | ||||
| JP2000122295A | ||||
| JP2000336121A |
Attorney, Agent or Firm:
Atsushi Aoki
Koichi Itsubo
Higuchi Souji
Masami Enohara
Kurachi Yasuyuki
Ryu Kobayashi
Koichi Itsubo
Higuchi Souji
Masami Enohara
Kurachi Yasuyuki
Ryu Kobayashi