Title:
化学増幅レジスト用コポリマー
Document Type and Number:
Japanese Patent JP4080916
Kind Code:
B2
Abstract:
A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and has improved sensitivity and resolution. In one embodiment, the copolymer is comprised of an alpha-cyano- or an alpha-trifluoro-methacrylate monomer unit and a vinyl ether monomer unit. A lithographic photoresist composition containing the fluorinated copolymer is also provided, as is a process for using the composition to generate resist images on a substrate, i.e., in the manufacture of integrated circuits or the like.
Inventors:
Hiroshi Ito
Application Number:
JP2003050104A
Publication Date:
April 23, 2008
Filing Date:
February 26, 2003
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08F220/10; C08F216/16; C08F220/44; C08F232/04; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2001154362A | ||||
| JP2003212915A | ||||
| JP2003040926A | ||||
| JP2005508013A | ||||
| JP2001233917A |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Takeshi Ueno
Yoshihiro City
Takeshi Ueno