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Patent Searching and Data


Title:
A cleaning method of abrasive cloth, and a grinding method of a wafer
Document Type and Number:
Japanese Patent JP6065802
Kind Code:
B2
Inventors:
Takuya Sasaki
Application Number:
JP2013208430A
Publication Date:
January 25, 2017
Filing Date:
October 03, 2013
Export Citation:
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Assignee:
Shin-Etsu Semiconductor Co., Ltd.
International Classes:
B24B53/017; B24B37/20; B24B53/007; H01L21/304
Domestic Patent References:
JP11262854A
JP2002270555A
JP2003229393A
JP2011104693A
Foreign References:
US6155912
US20090137191
Attorney, Agent or Firm:
Mikio Yoshimiya