Title:
A cleaning method of industrial plant apparatus
Document Type and Number:
Japanese Patent JP6121472
Kind Code:
B2
Abstract:
Cleaning industrial plant components to remove silane, metal halide, and organometallic halide contaminants and mixtures thereof, involves treating the plant components with a liquid nitrile or amine or mixture thereof or with a solution of a nitrile or amine or mixture thereof in an aprotic solvent.
Inventors:
Jabbard, moseni
Konrad, Moutner
Peter, Nuremberg
Christian, Karten Markner
Claus, Kepler
Andreas, Bockholt
Konrad, Moutner
Peter, Nuremberg
Christian, Karten Markner
Claus, Kepler
Andreas, Bockholt
Application Number:
JP2015079119A
Publication Date:
April 26, 2017
Filing Date:
April 08, 2015
Export Citation:
Assignee:
Wacker Chemie AG
International Classes:
B08B3/04; C23G5/032; C23G5/036
Domestic Patent References:
| JP2002219432A | ||||
| JP2011519724A | ||||
| JP2012532827A | ||||
| JP2006091238A | ||||
| JP2006258890A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hirohito Katsunuma
Mari Asano
Takaaki Suemori
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hirohito Katsunuma
Mari Asano
Takaaki Suemori