Title:
The cleaning method and cleaning system of a semiconductor substrate
Document Type and Number:
Japanese Patent JP6132082
Kind Code:
B2
Inventors:
Haruyoshi Yamakawa
Yuichi Ogawa
Yuichi Ogawa
Application Number:
JP2012183677A
Publication Date:
May 24, 2017
Filing Date:
August 22, 2012
Export Citation:
Assignee:
Kurita Water Industries Ltd.
International Classes:
H01L21/304; H01L21/306
Domestic Patent References:
| JP2009535846A | ||||
| JP2010186984A | ||||
| JP2013021065A | ||||
| JP11162930A |
Attorney, Agent or Firm:
Yuki Yokoi
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