Title:
WAFER CLEANING METHOD
Document Type and Number:
Japanese Patent JP2017168710
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a wafer cleaning method by which a stable water-repellent property can be imparted to a wafer surface without causing the degradation of a vinyl chloride resin even in the case of using a chemical solution for water-repellent protection film formation which has been stored over a long time in wafer cleaning by using a wafer cleaning apparatus including the vinyl chloride resin as a liquid-contact member.SOLUTION: A wafer cleaning method comprises: a preparation step for mixing a first liquid containing a sililation reagent, and a second liquid containing tertiary alcohol to prepare a chemical solution for water-repellent protection film formation; and a water-repellent protection film formation step for holding the chemical solution for water-repellent protection film formation at least in a concave portion of a convex-concave pattern to form a water-repellent protection film on the surface of the concave portion after the preparation step. The amount of the tertiary alcohol is 80-100 mass% to a total amount of nonaqueous solvent, including an aprotic solvent included in the first liquid and the tertiary alcohol in the second liquid. The content of the sililation reagent is 1-20 mass% to a total amount of the first liquid and the second liquid.SELECTED DRAWING: Figure 3
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Inventors:
OKUMURA YUZO
FUKUI YUKI
TAKATA TOMOHIRO
FUKASAWA HIROKI
SAIO TAKASHI
KUMON SOICHI
FUKUI YUKI
TAKATA TOMOHIRO
FUKASAWA HIROKI
SAIO TAKASHI
KUMON SOICHI
Application Number:
JP2016053514A
Publication Date:
September 21, 2017
Filing Date:
March 17, 2016
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
H01L21/304
Attorney, Agent or Firm:
Yoshiyuki Nishi