Title:
コバルト錯体及びその製造方法、コバルト含有薄膜及びその作製方法
Document Type and Number:
Japanese Patent JP6584150
Kind Code:
B2
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Inventors:
Hiroyuki Oike
Atsushi Maniwa
Yasushi Furukawa
Kazuhisa Kono
Kenichi Tada
Atsushi Maniwa
Yasushi Furukawa
Kazuhisa Kono
Kenichi Tada
Application Number:
JP2015109527A
Publication Date:
October 02, 2019
Filing Date:
May 29, 2015
Export Citation:
Assignee:
Tosoh Corporation
Sagami Central Chemical Research Institute
Sagami Central Chemical Research Institute
International Classes:
C07F17/02; C07F19/00; C23C16/18; H01L21/28; H01L21/285
Domestic Patent References:
| JP2010528183A | ||||
| JP2003328130A | ||||
| JP9235287A | ||||
| JP2011524078A | ||||
| JP2002114796A | ||||
| JP2003342286A | ||||
| JP2005256058A |
Foreign References:
| CN102408454A | ||||
| SU1740379A | ||||
| WO2008111499A1 |
Other References:
Makromolekulare Chemie,1993年,194(6),1671-80
Organometallic Chemistry in the USSR,1988年,1(6),739-740
日本化学会,第4版 実験化学講座 18.有機金属錯体,丸善株式会社,1991年 1月 7日,P293-327
Tetrahedron: Asymmetry,1999年,10(9),1647-1651
Journal of Organometallic Chemistry,2006年,691(6),1183-1196
Organometallics,2004年,23(25),5944-5957
Journal of Organometallic Chemistry,1984年,272(2),251-63
Organometallic Chemistry in the USSR,1988年,1(6),739-740
日本化学会,第4版 実験化学講座 18.有機金属錯体,丸善株式会社,1991年 1月 7日,P293-327
Tetrahedron: Asymmetry,1999年,10(9),1647-1651
Journal of Organometallic Chemistry,2006年,691(6),1183-1196
Organometallics,2004年,23(25),5944-5957
Journal of Organometallic Chemistry,1984年,272(2),251-63