Title:
組成物および該組成物を用いて製造される膜
Document Type and Number:
Japanese Patent JP6443148
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a composition useful for forming an insulating film having excellent dielectric properties.SOLUTION: A composition contains: a compound (A) that has a cyclic ether residue (a group formed by removing one or more H atoms from a cyclic ether compound) and has no ethylenically unsaturated double bond, and is liquid at 10°C; a polymer (B) that contains repeating units; and a compound (C) that is decomposed by irradiation of electromagnetic waves or electron beams or heating to generate an acid or a crosslinking agent (D). [Ris H or methyl; Ris alkylene or the like; Ris F, fluorinated alkyl, or the like;is H, alkyl, or the like]SELECTED DRAWING: None
Inventors:
Koichi Yahagi
Application Number:
JP2015051763A
Publication Date:
December 26, 2018
Filing Date:
March 16, 2015
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08G59/40; C08G59/68; C08G65/18; H01L21/336; H01L29/786; H01L51/05; H01L51/30
Domestic Patent References:
| JP2012074683A | ||||
| JP2008522004A | ||||
| JP2016172846A | ||||
| JP2009167430A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto