Title:
A compound, admiration active light nature or a radiation-sensitive resin composition, a resist film, a pattern formation method, and a manufacturing method of an electronic devide using these
Document Type and Number:
Japanese Patent JP6027934
Kind Code:
B2
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Inventors:
Yokogawa Natsumi
Hiroo Takizawa
Hirano Osamu
Wataru Futashi
Hideaki Tsubaki
Hiroo Takizawa
Hirano Osamu
Wataru Futashi
Hideaki Tsubaki
Application Number:
JP2013075196A
Publication Date:
November 16, 2016
Filing Date:
March 29, 2013
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C07C381/12; C08F12/30; C08F20/38; G03F7/038; G03F7/039; G03F7/32
Domestic Patent References:
| JP7179511A | ||||
| JP2011053560A | ||||
| JP2012237983A | ||||
| JP2011006400A | ||||
| JP2013033229A | ||||
| JP2012242657A | ||||
| JP2012247502A | ||||
| JP2013182023A | ||||
| JP2006241384A | ||||
| JP2004250427A |
Attorney, Agent or Firm:
Takeshi Takamatsu
Toshiyuki Ozawa
Toshiyuki Ozawa
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