Title:
COMPOUND, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
Document Type and Number:
Japanese Patent JP2017014191
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a compound, an organic layer composition containing the compound, an organic layer produced from the organic layer composition, and a method of forming patterns using the organic layer composition, which provide an excellent organic layer excellent in at least one of etch resistance and heat resistance even when produced by a spin-on coating method.SOLUTION: One embodiment of the compound of the present invention is represented by the chemical formula 1 in the figure, where the symbols are as defined in the specification.SELECTED DRAWING: None
Inventors:
KWON HYO-YOUNG
KANG SUN-HAE
NAMGUNG RAN
NAM YOUNHEE
HEO YU-MI
KIM YOUNG MIN
MUN SOO-HYEON
KANG SUN-HAE
NAMGUNG RAN
NAM YOUNHEE
HEO YU-MI
KIM YOUNG MIN
MUN SOO-HYEON
Application Number:
JP2016119307A
Publication Date:
January 19, 2017
Filing Date:
June 15, 2016
Export Citation:
Assignee:
SAMSUNG SDI CO LTD
International Classes:
C07D209/14; C07D209/58; C07D209/86; C07D311/82; C07D333/54; C07D333/56; C08G12/26; G03F7/11; G03F7/16; G03F7/26; H01L21/027
Domestic Patent References:
| JPS6485975A | 1989-03-30 | |||
| JPS5355222A | 1978-05-19 |
Foreign References:
| US20060142562A1 | 2006-06-29 | |||
| WO2004076461A1 | 2004-09-10 | |||
| WO2009031602A1 | 2009-03-12 | |||
| US20150001178A1 | 2015-01-01 | |||
| US20140183701A1 | 2014-07-03 |
Other References:
JOURNAL OF ORGANIC CHEMISTRY, vol. 64(21), JPN7020000661, 1999, pages 7890 - 7901, ISSN: 0004229428
Attorney, Agent or Firm:
Hatta International Patent Corporation
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