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Patent Searching and Data


Title:
光酸発生剤用化合物及びそれを用いたレジスト組成物、パターン形成方法
Document Type and Number:
Japanese Patent JP5401800
Kind Code:
B2
Abstract:
A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.

Inventors:
Hagiwara Warrior
ジョドリ Jonathan Joaquim
Satoshi Narizuka
Kazuhiko Maeda
Application Number:
JP2008033122A
Publication Date:
January 29, 2014
Filing Date:
February 14, 2008
Export Citation:
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Assignee:
Central Glass Co., Ltd.
International Classes:
C07C309/12; C07C381/12; C08F20/26; C08F32/08; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Makoto Koide