Title:
酸転写用組成物、酸転写用膜及びパターン形成方法
Document Type and Number:
Japanese Patent JP5423367
Kind Code:
B2
Abstract:
The acid transfer composition of the invention comprises a radiation-sensitive acid generator, a polymer having a nitrogen-containing group and a ketone-based solvent. The composition may comprise further a sensitizer. The pattern forming method of the invention comprises a second resin film formation process in which the acid transfer composition is used to form a second resin film (acid transfer film) on a first resin film containing an acid-dissociable group-containing resin, but not containing a radiation-sensitive acid generator, an exposure process for exposing the second resin film to a light through a mask to generate an acid in the second resin film, an acid transfer process for transferring the acid generated in the second resin film to the first resin film, and a second resin film removing process.
Inventors:
Koji Nishikawa
Application Number:
JP2009278940A
Publication Date:
February 19, 2014
Filing Date:
December 08, 2009
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/095; C08F22/10; C08F22/36; G03F7/004; G03F7/38; H01L21/027
Domestic Patent References:
| JP2007316373A | ||||
| JP11095418A | ||||
| JP2003233189A | ||||
| JP2006169499A | ||||
| JP2006072329A |
Foreign References:
| WO2007054813A1 |
Attorney, Agent or Firm:
Kiyoshi Kojima
Yoshinobu Hagino
Yoshinobu Hagino
Previous Patent: JPS5423366
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