Title:
Compositions Containing Polymer-Type Thermo Acid Generators and Methods Therefor
Document Type and Number:
Japanese Patent JP6342993
Kind Code:
B2
Abstract:
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.
Inventors:
Wu Hempen
Hong Seung Yoon
Khao Yi
In jean
Ponesh Margaretta
Siyagarajan Mutier
Hong Seung Yoon
Khao Yi
In jean
Ponesh Margaretta
Siyagarajan Mutier
Application Number:
JP2016513365A
Publication Date:
June 13, 2018
Filing Date:
May 15, 2014
Export Citation:
Assignee:
AZED Electronic Materials (Luxembourg) Societe a Responsible Limite
International Classes:
G03F7/40; C08F8/44; C08F220/34; C09D133/06; G03F7/20; H01L21/027
Domestic Patent References:
| JP2011524930A |
Foreign References:
| US20090081589 |
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Katsunori Uenishi
Ichiro Torayama
Blacksmith
Katsunori Uenishi
Ichiro Torayama