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Title:
The constituent for polish
Document Type and Number:
Japanese Patent JP5972860
Kind Code:
B2
Abstract:
Provided is a polishing composition containing at least aluminum oxide abrasive grains and water, and having a pH of 8.5 or higher. The aluminum oxide abrasive grains have a specific surface area of 20 m 2 /g or less. It is preferable for the aluminum oxide abrasive grains to have an average secondary particle size of 0.1 µm or more and 20 µm or less. The polishing composition is used for polishing hard and brittle materials having a Vickers hardness of 1,500 Hv or higher, such as sapphire, silicon carbide, and gallium nitride.

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JPH07509511[Title of the Invention] Abrasive grains having a metal oxide film, a method for producing the same, and a polished product.
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WO/2002/064245PREPARATION OF PARTICLES BY HYDROLYZING A METAL CATION IN THE PRESENCE OF A POLYMER, RESULTING PARTICLES AND USES THEREOF
Inventors:
Hiroshi Asano
Kazumasa Tamai
Okada Yasunori
Application Number:
JP2013501013A
Publication Date:
August 17, 2016
Filing Date:
February 20, 2012
Export Citation:
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Assignee:
Fujimi Incorporated Co., Ltd.
International Classes:
C09K3/14; B24B37/00; C09G1/02; H01L21/304
Domestic Patent References:
JPH051279A1993-01-08
JP2002506915A2002-03-05
JP2006203188A2006-08-03
JP2000239652A2000-09-05
JP2010284784A2010-12-24
JPH051279A1993-01-08
JP2002506915A2002-03-05
JP2006203188A2006-08-03
Foreign References:
WO2011136387A12011-11-03
WO2011136387A12011-11-03
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda



 
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