A covering film, its manufacturing method, and a PVD device

Japanese Patent JP6273563

B2

The purpose of the invention is to provide technology, which, in addition to being capable of forming thick hard carbon films of excellent durability even using PVD, is able to establish both chipping resistance and abrasion resistance in the formed hard carbon film and able to improve low friction properties and peeling resistance. Provided is a coating film to be coated on the surface of a substrate, the coating film having a total film thickness of greater than 1 µm to 50 µm wherein: when a cut surface is observed using bright field TEM images, white hard carbon layers that are shown as relatively white and black hard carbon layers that are shown as black are alternately laminated in the thickness direction; and the white hard carbon layers have regions that have grown in a fan-shape in the thickness direction. Provided is a coating film manufacturing method for forming the coating film on the surface of a substrate using PVD, wherein conditions for film formation on the substrate are controlled so that the substrate repeatedly alternates temperature increase and temperature decrease between a low temperature range of greater than 50°C to 200°C and a high temperature range of greater than 200°C to 300°C, and the substrate is rotated and/or made to revolve.

Hideki Moriguchi
Akinori Shibata
Takehiko Oshiro
Yoshihiro Ito
Oka Saki Takahiro
Hiroyuki Sugiura

JP2017519015A

February 07, 2018

December 16, 2016

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Japan ITF Co., Ltd.
Nippon Piston Ring Co., Ltd.

C23C14/06; C01B32/05; C23C14/32; F16J9/26

JP2012527583A
JP2009504448A
JP2015063714A
JP2008001951A
JP2002322555A
JP10226874A
JP2007169698A

WO2012063735A1
WO2017026043A1

Tetsuji Kamidai
Naomi Kamino

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