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Title:
誘電体薄膜の作成方法
Document Type and Number:
Japanese Patent JP4351478
Kind Code:
B2
Abstract:

To provide a method capable of easily manufacturing a dielectric thin film having few cracks, stable quality, and an excellent close contacting property with a substrate, at low cost.

At a mixing process, a thin film synthesizing liquid is prepared by dissolving barium nitrate, fluorotitanium ammonium, and boric acid in distilled water, and titrating the above liquid by concentrated nitric acid so as to become pH 1 to 2. Next, a platinum-coated slide glass is made to stationarily float on the thin film synthesizing liquid for 2 hours as a thin-film making process. Afterwards, the slide glass is taken out from the thin film synthesizing liquid, cleaned by the distilled water, and dried by leaving it in the atmosphere for 48 hours.

COPYRIGHT: (C)2005,JPO&NCIPI


Inventors:
Takahiko peak
Yoshitake Masuda
Kunihito Kawamoto
Application Number:
JP2003174214A
Publication Date:
October 28, 2009
Filing Date:
June 19, 2003
Export Citation:
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Assignee:
Daiken Chemical Industry Co., Ltd.
International Classes:
C01G23/00; H01B19/00; H01L21/316; H01L21/8246; H01L27/105
Domestic Patent References:
JP5085728A
JP2001261434A
JP2002248163A
JP2000191323A
JP4362014A
JP5009026A
JP5124817A
Attorney, Agent or Firm:
Hisami Miki