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Title:
結晶性酸化物膜
Document Type and Number:
Japanese Patent JP7315137
Kind Code:
B2
Abstract:
A crystalline oxide film with excellent crystalline qualities that is useful for semiconductors requiring heat dissipation is provided. A crystalline oxide film including a first crystal axis, a second crystal axis; a metal oxide as a major component that includes gallium, a first side; and a second side that is shorter than the first side, a linear thermal expansion coefficient of the first crystal axis is smaller than a linear thermal expansion coefficient of the second crystal axis, a direction of the first side is parallel and/or substantially parallel to a direction of the first crystal axis, and a direction of the second side is parallel and/or substantially parallel to a direction of the second crystal axis.

Inventors:
▲高▼橋 勲
Tatsuya Toriyama
Masahiro Sugimoto
Takashi Shinohe
Hideyuki Kamito
Atsushi Ohara
Fusao Hirose
Hideo Matsuki
Application Number:
JP2018242291A
Publication Date:
July 26, 2023
Filing Date:
December 26, 2018
Export Citation:
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Assignee:
株式会社FLOSFIA
株式会社デンソー
International Classes:
H01L21/365; C23C16/40; C30B25/18; C30B29/16; H01L21/329; H01L21/337; H01L21/338; H01L21/368; H01L23/29; H01L23/34; H01L29/06; H01L29/12; H01L29/24; H01L29/739; H01L29/778; H01L29/78; H01L29/808; H01L29/812; H01L29/861; H01L29/868; H01L29/872; H01L33/26
Domestic Patent References:
JP2016098166A
JP2011145309A1
JP2015199648A
JP2018170509A
JP2018082144A
JP2018082006A
Foreign References:
WO2018043503A1