To provide an organic halogen compound processing method by which the amount of exhaust gas discharged film a kiln can be reduced and the energy for processing the organic halogen compound can be reduced as a result and the burden on cooling after recombustion and on a dust collector is made small.
The organic halogen compound processing method includes a first process of heating a material to be processed which contains the organic halogen compound at 400 to 700°C in a low oxygen atmosphere of ≤5% in oxygen concentration by a heater 1 to volatilize the organic halogen compound, and a second process of injecting oxygen into gas containing the organic halogen compound volatilized from the material to be processed by an oxidation cracking unit 3 and heating the material to be processed by bringing the same into contact with an inorganic solid for promoting oxidative decomposition of the organic halogen compound to perform the oxidative decomposition of the organic halogen compound.
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Katsuya Sasaki
Ueda Kozo
Satoshi Iwamoto
Shozo Umemura
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Einosuke Kishimoto
Akira Watanabe
Kiyosue Yasuko