Title:
The designing method of an etching mask, the manufacturing method of a structure, and an etching mask
Document Type and Number:
Japanese Patent JP6277677
Kind Code:
B2
Inventors:
Sasae Keidai
Koji Fujimoto
Takamasa Takano
Koji Fujimoto
Takamasa Takano
Application Number:
JP2013228695A
Publication Date:
February 14, 2018
Filing Date:
November 01, 2013
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
H01L21/306; B81C1/00
Domestic Patent References:
| JP2013099802A | ||||
| JP9190998A | ||||
| JP2008168552A | ||||
| JP2007098813A | ||||
| JP2007320201A | ||||
| JP2009059958A | ||||
| JP9246254A |
Attorney, Agent or Firm:
Takahashi Hayashi & Partners