Title:
A developing method, a development device, and the recording medium in which computer reading is possible
Document Type and Number:
Japanese Patent JP6215787
Kind Code:
B2
Abstract:
There is provided a method of developing an exposed resist film formed on a surface of a substrate to form a resist pattern, which includes: rotating the substrate about a rotation axis that extends in a direction perpendicular to the surface of the substrate that is horizontally supported; supplying a developing solution through a discharge hole positioned above the substrate onto the resist film such that the developing solution is widely spread on a surface of the resist film; and positioning a wetted part having a surface that faces the surface of the substrate, above a preceding region in the surface of the substrate, the preceding region being a region to which the developing solution is preferentially supplied through the discharge hole.
Inventors:
Tomohiro Iseki
Hiroshi Takeguchi
Yuichi Terashita
Hiroshi Takeguchi
Yuichi Terashita
Application Number:
JP2014152123A
Publication Date:
October 18, 2017
Filing Date:
July 25, 2014
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; B05C11/00; B05C11/08; B05D1/40; B05D3/12; G16Z99/00
Domestic Patent References:
| JP4217257A | ||||
| JP2000173906A | ||||
| JP2006066799A | ||||
| JP2012074589A | ||||
| JP9167747A | ||||
| JP2005268320A |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Toshiaki Matsuzawa
Yoshiki Kuroki
Junji Kashiwaoka
Toshiaki Matsuzawa