Title:
A diene system carboxylate anion, its salt and its polymerization, or a hardenability constituent
Document Type and Number:
Japanese Patent JP6126269
Kind Code:
B2
Abstract:
The claimed invention provides a novel compound not having been studied before, that is, a diene carboxylate anion that contains a specific structure, and a salt thereof. The claimed invention further provides a diene carboxylate anion and a salt thereof, especially a metal salt thereof, which are easily soluble in general organic solvents, reactive diluents, and resins, may be in a liquid state at normal temperature depending on the structure, and have high polymerizability. Polymerization/curing of these produces a resin to which many ionic bonds and a metal are introduced, providing various properties such as hardness, scratch resistance, anti-fingerprint property, gas-barrier property, water vapor barrier property, oxygen absorption property, ultraviolet protection, infrared protection, color development and coloring, high refractive index, adhesion, various catalytic abilities, fluorescence ability and light-emitting ability, optical amplification, dispersibility, and antistatic properties. In addition, the anion and the salt can be used for raw materials for functional fine particles and for metal nanoparticle composites, and also for MOD materials. The claimed invention also provides an advantageous method for producing the diene carboxylate anion and the salt thereof.
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Inventors:
Tomomasa Kaneko
Application Number:
JP2016087858A
Publication Date:
May 10, 2017
Filing Date:
April 26, 2016
Export Citation:
Assignee:
Nippon Shokubai Co., Ltd.
International Classes:
C07C59/60; C07C51/41; C08F20/04
Domestic Patent References:
| JP50052027A | ||||
| JP2010037549A | ||||
| JP2010168539A |
Other References:
WIEST,O. et al,Stabilization of the Transition State of the Chorismate-Prephenate Rearrangement: An ab Initio Study,Journal of the American Chemical Society,1995年,Vol.117, No.47,pp.11628-39
GAJEWSKI,J.J. et al,The mechanism of rearrangement of chorismic acid and related compounds,Journal of the American Chemical Society,1987年,Vol.109, No.4,pp.1170-86
Synthetic Communications,1995年,25(5),pp.641-650
Chem. Commun.,2002年,(9),pp.972-973
GAJEWSKI,J.J. et al,The mechanism of rearrangement of chorismic acid and related compounds,Journal of the American Chemical Society,1987年,Vol.109, No.4,pp.1170-86
Synthetic Communications,1995年,25(5),pp.641-650
Chem. Commun.,2002年,(9),pp.972-973
Attorney, Agent or Firm:
Atomi International Patent Office
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