Title:
The directions for the grinding agent particles processed using a polish constituent and amino Silane
Document Type and Number:
Japanese Patent JP6158777
Kind Code:
B2
Abstract:
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
Inventors:
Grumvine, Stephen
Lee, Sho Chang
Ward, william
Shin, Pankazi
Dissad, Jeffrey
Lee, Sho Chang
Ward, william
Shin, Pankazi
Dissad, Jeffrey
Application Number:
JP2014226224A
Publication Date:
July 05, 2017
Filing Date:
November 06, 2014
Export Citation:
Assignee:
CABOT MICROELECTRONICS CORPORATION
International Classes:
B24B37/00; C09G1/02; C09K3/14; H01L21/304
Domestic Patent References:
| JP1057919A1 | ||||
| JP2004502823A | ||||
| JP2001345295A | ||||
| JP2006269910A | ||||
| JP2004526308A |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Naoki Kobayashi
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Naoki Kobayashi
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