Title:
The dispatch control method of a furnace process
Document Type and Number:
Japanese Patent JP6133911
Kind Code:
B2
Abstract:
A dispatch control method for a furnace process including the following steps is provided. Before a plurality of lots of wafers is loaded into a furnace, the characteristic variation value of each of the plurality of lots of wafers is calculated. The plurality of lots of wafers is ordered according to the size of the characteristic variation values. The plurality of lots of wafers is placed in the furnace in a descending order of the characteristic variation values corresponding to a plurality of locations in the furnace causing the characteristic variation values to change from smaller to larger.
Inventors:
Kure Shuntatsu
Xiao Sejong
Under construction
Xiao Sejong
Under construction
Application Number:
JP2015010625A
Publication Date:
May 24, 2017
Filing Date:
January 22, 2015
Export Citation:
Assignee:
Power Crystal Technology Co., Ltd.
International Classes:
H01L21/324; G05B19/418; H01L21/02; H01L21/22
Domestic Patent References:
| JP2004510338A | ||||
| JP2004119800A | ||||
| JP98100A | ||||
| JP8328608A |
Attorney, Agent or Firm:
Koichi Washida
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