Title:
Double lens gun electron beam device for high resolution imaging using both high beam current and low beam current
Document Type and Number:
Japanese Patent JP6310920
Kind Code:
B2
Abstract:
One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.
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Inventors:
Jean Shin Long
Han Rikun
Han Rikun
Application Number:
JP2015532101A
Publication Date:
April 11, 2018
Filing Date:
September 13, 2013
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
H01J37/28; H01J37/04; H01J37/06; H01J37/09
Domestic Patent References:
| JP2002352759A | ||||
| JP1143217A | ||||
| JP2003502823A | ||||
| JP11233053A | ||||
| JP2003173581A |
Foreign References:
| US7821187 | ||||
| WO2011062810A1 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office