Title:
マランゴニ効果を増大させるための乾燥装備及び乾燥方法
Document Type and Number:
Japanese Patent JP4012053
Kind Code:
B2
Abstract:
A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.
Inventors:
Lee constitution
Gold money
Full phase
Lee
Lee
Park Sogo
Tanaka
Gold money
Full phase
Lee
Lee
Park Sogo
Tanaka
Application Number:
JP2002350394A
Publication Date:
November 21, 2007
Filing Date:
December 02, 2002
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
F26B9/06; H01L21/304; F26B11/02; H01L21/00; H01L21/683
Domestic Patent References:
| JP2000277481A | ||||
| JP2000164548A | ||||
| JP10041266A | ||||
| JP10135175A | ||||
| JP10321584A | ||||
| JP10247635A | ||||
| JP11162923A | ||||
| JP3080537A | ||||
| JP11062838A |
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe
Takashi Watanabe