Title:
An electron beam device and an electron beam observation method
Document Type and Number:
Japanese Patent JP6216515
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To solve such problems that the contrast becomes obscure at an observation part in an electron beam device, due to miniaturization or three-dimensional device structure, and that it takes time to search the irradiation conditions of primary electrons for optimizing the contrast, or to search the filtering conditions of detection electrons, or the measurement reproducibility is deteriorated.SOLUTION: The information of sample shape and the information of potential are acquired simultaneously, by using means for separating the energy of electrons generated from a sample, and signal processing means performing the addition and subtraction processing of the plurality of detection means, and then the filtering conditions of secondary electrons are determined for each irradiation conditions of primary electrons. Consequently, the search times of the irradiation conditions and the filtering conditions are shortened, and an optimum contrast can be obtained. Furthermore, the charging is monitored in real time during observation, and a highly accurate length measurement value is obtained while enhancing the reliability.
Inventors:
Shin Sakakibara
Osamu Nasu
Hideyuki Kazumi
Muneyuki Fukuda
Hiroya Ota
Akiyoshi Tanimoto
Enyama Hyakuyo
Osamu Nasu
Hideyuki Kazumi
Muneyuki Fukuda
Hiroya Ota
Akiyoshi Tanimoto
Enyama Hyakuyo
Application Number:
JP2013014987A
Publication Date:
October 18, 2017
Filing Date:
January 30, 2013
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/28; H01J37/05; H01J37/147; H01J37/153; H01J37/20; H01J37/22; H01J37/244
Domestic Patent References:
| JP2000188310A | ||||
| JP2006261111A | ||||
| JP2012003902A | ||||
| JP7288096A |
Attorney, Agent or Firm:
Yuji Toda