Title:
電子光学システム
Document Type and Number:
Japanese Patent JP7194849
Kind Code:
B2
Abstract:
An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective lens disposed along an optical axis. The system includes a first Wien filter disposed along the optical axis and a second Wien filter disposed along the optical axis. The first Wien filter and the second Wien filter are disposed between the source lens and the objective lens. The first Wien filter is configured to correct chromatic aberration in the primary beam. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.
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Inventors:
Jean Shin Rong
Sears Christopher
Sears Christopher
Application Number:
JP2022018557A
Publication Date:
December 22, 2022
Filing Date:
February 09, 2022
Export Citation:
Assignee:
KLA Corporation
International Classes:
H01J37/153; H01J37/147; H01J37/28
Domestic Patent References:
| JP2142045A | ||||
| JP2002367552A | ||||
| JP2008153131A | ||||
| JP2015032360A | ||||
| JP2015130309A | ||||
| JP2016139456A |
Foreign References:
| US20150340200 | ||||
| US20160329189 |
Attorney, Agent or Firm:
Patent Attorney Corporation YKI International Patent Office