To provide an electron microscope capable of improving the reliability of observation data and analysis data and averts analysis errors due to contamination.
A charged particle beam device has an irradiation system, having an objective lens for focusing charged particle beams and irradiating a sample with the focused beams; a deflection scanning system for deflection-scanning the charged particle beams; and a scanning image forming system for detecting signals generated from the sample by the irradiation of the charged particle beams and then forming a scanning image. A first image, obtained prior to the start of the analysis of the sample is compared with a second image, obtained after the start of the analysis of the sample. Based on this, when changes in the image of the sample are observed, a contamination film forming treatment is performed which forms a contamination film on the surface of the sample.
COPYRIGHT: (C)2008,JPO&INPIT
Nakayama Yoshihiko
Ryoichi Ishii
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