Title:
バッチ式熱処理装置の運用方法
Document Type and Number:
Japanese Patent JP4232307
Kind Code:
B2
Abstract:
In a batch type vertical heat-treating method, first, product wafers and dummy wafers are set to be stacked on an upstream side of a flow of a process gas, in heat treatment, within main holding positions of a holder. The dummy substrates are set more downstream of the process gas than the product wafers. The product wafers and the dummy wafers are set in the holder in a total number smaller than a total number of the main holding positions corresponding to a maximum number of wafers that can be held by the holder, and the holder is in a partially loaded state. The partially loaded holder is loaded in a process vessel, and the product wafers are processed in the process vessel.
Inventors:
Katohisashi Kato
Keiko Sano
Yukio Yamamoto
Hiroyuki Kikuchi
Keiko Sano
Yukio Yamamoto
Hiroyuki Kikuchi
Application Number:
JP2000013531A
Publication Date:
March 04, 2009
Filing Date:
January 21, 2000
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/22; H01L21/31; F27B5/04; F27B5/10; F27B5/18; F27D7/00; F27D7/06; H01L21/00
Domestic Patent References:
| JP11040763A | ||||
| JP11040504A | ||||
| JP8188468A |
Attorney, Agent or Firm:
Akihiro Asai
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