Title:
エステル化合物、高分子化合物、レジスト材料、及びパターン形成方法
Document Type and Number:
Japanese Patent JP4371206
Kind Code:
B2
Abstract:
An ester compound is new. An ester compound of formula (1) is new. [Image] A 1>polymerizable functional group having carbon-to-carbon bond; A 2>divalent group consisting of furandiyl, tetrahydrofurandiyl, or oxanorbornanediyl; R 1> and R 2>1-10C monovalent hydrocarbon; R 1>R 2>aliphatic hydrocarbon ring with the carbon atom to which they are bonded; R 3>H or 1-10C monovalent hydrocarbon which may contain a hetero atom. An independent claim is also included for a process for forming a resist pattern, comprising applying the resist composition onto a substrate to form a coating; heat treating the coating and exposing to high-energy radiation or electron beams through a photomask; and optionally heat treating the exposed coating and developing with a developer.
Inventors:
Koji Hasegawa
Tsuyoshi Kanao
Takeshi Watanabe
Tsuyoshi Kanao
Takeshi Watanabe
Application Number:
JP2003330904A
Publication Date:
November 25, 2009
Filing Date:
September 24, 2003
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07D307/12; C07D307/00; C07D307/33; C07D493/08; C08F20/26; C08F20/30; C08F32/00; C08G61/08; G03F7/039
Domestic Patent References:
| JP2000267287A | ||||
| JP2002156760A | ||||
| JP11223950A | ||||
| JP2001235865A |
Foreign References:
| US20020132182 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Saori Shigematsu
Katsunari Kobayashi
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