Title:
An exposure device, an exposure method, and a device manufacturing method
Document Type and Number:
Japanese Patent JP5935929
Kind Code:
B2
Abstract:
When a transition from a first state where one stage (WST1 (or WST2)) is positioned at a first area directly below projection optical system (PL) to which liquid (Lq) is supplied to a state where the other stage (WST2 (or WST1)) is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.
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Inventors:
Yuichi Shibasaki
Application Number:
JP2015124507A
Publication Date:
June 15, 2016
Filing Date:
June 22, 2015
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; H01L21/68
Domestic Patent References:
| JP10163098A | ||||
| JP2001223159A | ||||
| JP2000164504A | ||||
| JP2001118773A | ||||
| JP2003017404A | ||||
| JP2006319367A | ||||
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| JP2004289128A | ||||
| JP2004165666A |
Foreign References:
| WO1999049504A1 | ||||
| WO1998040791A1 | ||||
| WO2004090577A2 |
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani