Title:
An exposure device, an exposure method, and a device manufacturing method
Document Type and Number:
Japanese Patent JP6172547
Kind Code:
B2
Abstract:
A drive device drives a wafer table (wafer stage WST) in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer table (WTB) in the Y-axis direction and based on known correction information in accordance with position information of the wafer table (WTB) in non-measurement directions (e.g. Z, ¸z and ¸x directions) that are measured by interferometers (16, 43A are 43B) at the time of the measurement by the encoder. That is, the wafer table (a movable body) is driven in the Y-axis direction based on the measurement value of the encoder that has been corrected by correction information for correcting a measurement error of the encoder that is caused by a relative displacement of a head and a scale in the non-measurement direction. Accordingly, the movable body can be driven with high accuracy in a desired direction while measuring the position by the encoder, without being affected by the relative motion between the head and the scale in directions other than a direction to be measured (measurement direction).
Inventors:
Yuichi Shibasaki
Application Number:
JP2016004040A
Publication Date:
August 02, 2017
Filing Date:
January 13, 2016
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G01B11/00; G01D5/347; H01L21/68
Domestic Patent References:
JP7270122A | ||||
JP2006128693A | ||||
JP9318321A | ||||
JP2006210570A | ||||
JP3167419A | ||||
JP2000068192A | ||||
JP2002151405A |
Foreign References:
WO2006057263A1 |
Attorney, Agent or Firm:
Atsushi Tateishi
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