Title:
An exposure device, a stage device, and a device manufacturing method
Document Type and Number:
Japanese Patent JP5984413
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide exposure equipment having a technology advantageous to high-precision measurement of a position of a stage.SOLUTION: Exposure equipment transferring a pattern of an original plate to a substrate, comprises: a substrate stage for holding the substrate; a laser interferometer for measuring a position of the substrate stage; a first blow-out part for blowing air; a duct arranged along a light path of the laser interferometer; and a draw-in part for spraying air to generate a Bernoulli effect and drawing air blown out from the first blow-out part into the duct by using the Bernoulli effect. The duct includes a second blow-out part for blowing out air flowing in the duct toward the light path, and a temperature in the light path is adjusted by the air blown out from the second blow-out part.
Inventors:
Hirokazu Sekine
Application Number:
JP2012023507A
Publication Date:
September 06, 2016
Filing Date:
February 06, 2012
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G01B9/02
Domestic Patent References:
| JP1274001A | ||||
| JP2007158305A | ||||
| JP2010056545A |
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Previous Patent: The control method of an imaging device and an imaging device, a program
Next Patent: JPS5984414
Next Patent: JPS5984414