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Patent Searching and Data


Title:
EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2016127226
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To cause desired temperature distribution inside a pattern region of a reticle during exposure.SOLUTION: An exposure device 100 comprises: a reticle stage RST which can hold and move a reticle R including a pattern region where a pattern is formed in an XY plane; an irradiation device 30 which can irradiate non-exposure light NL having a wavelength different from that of exposure light IL; and a control device which irradiates a part of the reticle R with the non-exposure light NL via the irradiation device 30 on the basis of information related to transmittance distribution of the pattern region.SELECTED DRAWING: Figure 1

Inventors:
SHIBAZAKI YUICHI
Application Number:
JP2015002074A
Publication Date:
July 11, 2016
Filing Date:
January 08, 2015
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Atsushi Tateishi