Title:
An exposure method, an exposure device, and a device manufacturing method
Document Type and Number:
Japanese Patent JP6249179
Kind Code:
B2
Abstract:
A liquid immersion device (132) has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of a liquid, which is supplied onto a liquid repellent film on the surface of an object (member) arranged on the light emitting side of a projection optical system (PL), and an liquid immersion area is formed by supplying a liquid (Lq) in which the predetermined substance is dissolved onto the liquid repellent film.
More Like This:
| JP2008070501 | LIGHT IRRADIATION SYSTEM |
| WO/2001/009921 | MINIMIZATION OF ELECTRON FOGGING IN ELECTRON BEAM LITHOGRAPHY |
| WO/2021/262488 | SYSTEMS AND METHODS FOR CHUCK CLEANING |
Inventors:
Kenichi Shiraishi
Ryuichi Hoshika
Tomoharu Fujiwara
Ryuichi Hoshika
Tomoharu Fujiwara
Application Number:
JP2015092710A
Publication Date:
December 20, 2017
Filing Date:
April 30, 2015
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; H01L21/683
Domestic Patent References:
| JP2005183693A | ||||
| JP2005005713A | ||||
| JP2005057278A | ||||
| JP2001188356A | ||||
| JP2006024819A |
Attorney, Agent or Firm:
Atsushi Tateishi