Title:
露光方法及び装置
Document Type and Number:
Japanese Patent JP4146673
Kind Code:
B2
Abstract:
Disclosed is an exposure method and apparatus (aligner) for exposure wherein there is reduced a physical load put on a driving mechanism which moves a supporting device for supporting a mask and an exposure object which has a photosensitive material, and the structure of the driving mechanism is simplified. The method comprises an incidence step of letting at least a part of light from a light source for exposure be incident on a mask supported by a supporting device; an imaging step of letting transmission light from the mask be incident on a photosensitive material supported by the supporting device from a direction which is different from a direction of light incident on the mask, thereby causing the transmission light to form an image on the photosensitive material; a rotation step of rotating the supporting device such that a position of irradiation to the mask caused by light from the light source changes along a circumferential direction of the supporting device; and an irradiation position changing step of changing the position of irradiation of light to the mask as well as a position of irradiation of light to the photosensitive material along a direction which is different from the circumferential direction of the supporting device in a rotating plane of the supporting device while the supporting device is being rotated.
Inventors:
Tsujikawa Shin
Yukio Taniguchi
Hirotaka Yamaguchi
Matsumura Masayoshi
Yukio Taniguchi
Hirotaka Yamaguchi
Matsumura Masayoshi
Application Number:
JP2002177098A
Publication Date:
September 10, 2008
Filing Date:
June 18, 2002
Export Citation:
Assignee:
LCD Advanced Technology Development Center Co., Ltd.
International Classes:
H01L21/027; G03B27/42; G03F7/20
Domestic Patent References:
| JP58058730A | ||||
| JP1308022A | ||||
| JP5174430A | ||||
| JP9312255A | ||||
| JP2001005188A |
Attorney, Agent or Firm:
Nobuyuki Matsunaga