A face mask and a manufacturing method for the same of knitting

Japanese Patent JP6170975

B2

Disclosed are a facial mask with double-sided stereoscopic cross micropores, and a manufacturing method thereof. According to the present invention, the manufacturing method of a facial mask with double-sided stereoscopic cross micropores comprises: a step of spinning a natural silk yarn and a synthetic yarn in order to form a fabric having a double-sided stereoscopic cross microporous structure. The fabric includes both a synthetic fiber surface and a natural silk surface, or both a synthetic fiber surface and a mixed yarn surface made of a synthetic yarn and a natural silk yarn. The natural silk surface or the mixed yarn surface includes at least about 50% of natural silk for skin contact. All of the synthetic fiber surface, the natural silk surface, and the mixed yarn surface have a stereoscopic cross microporous structure for promoting the absorption of essence, increasing relative moisture retaining ability, and enhancing the overall elasticity and skin compatibility of the facial mask. In comparison with a common pure natural silk facial mask, the facial mask in the present invention has a synthetic fabric structure on one surface, and is thus further inexpensive. Furthermore, the facial mask in the present invention has excellent skin affinity, moisture retaining ability, skin compatibility, and elasticity, in comparison with a nonwoven fabric facial mask, a fabric facial mask, or a biological facial mask. Therefore, the facial mask in the present invention has various effective properties and can enhance industrial competitiveness.

Lee Kazawa

JP2015192445A

July 26, 2017

September 30, 2015

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DANEE SILK INTERNATIONAL CO., LTD.

A45D44/22

JP3165241U
JP2008285433A
JP2004149933A

Katsuhiro Imashita
Kenji Okada

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