Title:
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD AND METHOD FOR MANUFACTURING SOLAR CELL
Document Type and Number:
Japanese Patent JP2018040029
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technique capable of efficiently and surely performing cooling when forming a metal layer on a substrate to be deposited by sputtering.SOLUTION: A substrate holder conveying mechanism 3 comprising: a forward path side conveying part 33a for conveying a substrate holder 11 for holding a substrate 50 to be deposited in a determined direction along a conveying path; a return path side conveying part 33c for conveying the substrate holder 11 in the opposite direction to the conveying direction of the forward path side conveying part 33a along the conveying path; and a conveyance returning part 30B for returning and conveying the substrate holder 11 toward a return path side conveying part 33c from the forward path side conveying part 33a in the state of maintaining a vertical relation is included in a vacuum chamber 2 having a single vacuum atmosphere. The forward path side conveying part 33a passes through a cooling region 7, and the return path side conveying part 33c is provided so as to pass through first and second metal layer deposition regions 4 and 5.SELECTED DRAWING: Figure 1
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Inventors:
MATSUZAKI JUNSUKE
TAKAHASHI AKIHISA
TAKAHASHI AKIHISA
Application Number:
JP2016173636A
Publication Date:
March 15, 2018
Filing Date:
September 06, 2016
Export Citation:
Assignee:
ULVAC CORP
International Classes:
C23C14/56; C23C14/34; H01L21/285; H01L31/0747; H01L31/18
Attorney, Agent or Firm:
Hideki Abe
Shigeo Ishijima
Shigeo Ishijima